Exposure Technology

If you want to build parts layer by layer there is no way to be more efficient than to expose the complete layer in one flash - do you agree? 

It was a long and winding road to get the mask generation system working and stable.
The Mask Generation Technology uses a new working principle as shown above. The advantages of the system are:

  • scalable in size
  • high power transmission
  • high speed

The new ZORRO System for AF will benefit from all features of the MGT, even if the ZORRO System cannot put it to the limit for now.
Our patented Mask Generation Technology has nearly no limit in resolution or the amount of energy we can pass through the mask.


This animation gives you an idea of the whole process:



» 05/04/09 - Sintermask licensed Powder Shuttle Technology from FIT [ more ]

» 04/24/09 - Partnership contract between netfabb and Sintermask [ more ]


» 03/30/12 - Technology Update 2012, FIT GmbH, Lupburg, Germany [  more ]

» 12/02/09 - Sintermask on Euromold 2009 [  more ]

» 05/12/09 - Rapid 2009 [  more ]